# Description of the device physical regions $Device { Region source_region { material = Si doping = 5e19 doping_type = donor } Region drain_region { material = Si doping = 5e19 doping_type = donor } Region oxide { material = SiO2 } Region channel # { material = Si } } # Definition of Simulation Models and associated Boundary Conditions $Models { model driftdiffusion { options { simulation_name = driftdiffusion physical_regions = all } physical_model recombination { model = srh } physical_model electron_mobility { model = field_dependent low_field_model = doping_dependent #Masetti model for Si !!! } BC_Regions { BC_Region gate { type = schottky barrier_height = 3.0 voltage = @Vg[0.0] } BC_Region source { type = ohmic voltage = 0.0 } BC_Region drain { type = ohmic voltage = @Vd[0.0] } } } } # Definition of Model-dependent Solver parameters $Solver { driftdiffusion { nonlinear_solver = tiber coupling = electrons ksp_type = bcgsl nonlin_max_it = 10 nonlin_step_tol = 1e-3 ls_max_step = 2 } Sweep { sweep_drain { simulation = driftdiffusion variable = Vd start = 0.0 stop = 3.5 steps = 70 #35 } sweep_gate { variable = Vg start = -0.5 # -1.0 stop = 2.0 steps = 7 # 200 # simulation = sweep_drain # } } } # Definition of Model dependent physical parameters $Physics { driftdiffusion { statistics = FD } } # Definition of model-indipendent parameters of the Simulation $Simulation { meshfile = Si_NWFET.msh dimension = 3 mesh_units = 1e-9 temperature = 300 solve = sweep_drain resultpath = output_IV output_format = vtk plot = (Ec, Ev, QFermi_e, QFermi_h, eDensity, hDensity, eCurrent, hCurrent, NetRecombination, EField, ElPotential, ContactCurrents) }