# Description of the device physical regions $Device { Region substrate { material = Si doping = 1e18 doping_type = acceptor } Region contact { material = Si doping = 5e19 doping_type = donor } Region oxide { material = SiO2 } } # Definition of Simulation Models and associated Boundary Conditions $Models { model driftdiffusion { options { simulation_name = driftdiffusion physical_regions = all } physical_model recombination { model = srh } physical_model electron_mobility { model = field_dependent low_field_model = doping_dependent #Masetti model for Si !!! } BC_Regions { BC_Region gate { type = schottky barrier_height = 3.0 voltage = @Vg[0.0] } BC_Region source { type = ohmic voltage = 0.0 } BC_Region drain { type = ohmic voltage = @Vd[0.5] } } } } # Definition of Model-dependent Solver parameters $Solver { driftdiffusion { nonlinear_solver = tiber coupling = electrons ksp_type = bcgsl nonlin_max_it = 10 nonlin_step_tol = 1e-3 ls_max_step = 2 } Sweep { sweep_drain { simulation = driftdiffusion variable = Vd start = 0.0 stop = 2.0 steps = 20 #plot_data = true } sweep_gate { variable = Vg start = -0.1 stop = 1.0 #0.5 steps = 11 # 6 simulation = sweep_drain plot_data = true } } } # Definition of Model dependent physical parameters $Physics { driftdiffusion { statistics = FD } } # Definition of model-indipendent parameters of the Simulation $Simulation { #searchpath = ../../materials meshfile = mosfet.msh dimension = 2 temperature = 300 solve = sweep_gate resultpath = output_IV_char #output_format = gmv output_format = vtk plot = (Ec, Ev, QFermi_e, eDensity, eCurrent, NetRecombination, EField, ElPotential, ContactCurrents) }