# Description of the device physical regions $Device { Region substrate { material = Si doping = 1e18 doping_type = acceptor } Region contact { material = Si doping = 5e19 doping_type = donor } Region oxide { material = SiO2 } } # Definition of Simulation Models and associated Boundary Conditions $Models { model driftdiffusion { options { simulation_name = driftdiffusion physical_regions = all } physical_model recombination { model = srh } physical_model electron_mobility { model = field_dependent low_field_model = doping_dependent #Masetti model for Si !!! } BC_Regions { BC_Region gate { type = schottky barrier_height = 3.0 voltage = @Vg[0.0] } BC_Region source { type = ohmic voltage = 0.0 } BC_Region drain { type = ohmic voltage = @Vd[0.5] } } } } # Definition of Model-dependent Solver parameters $Solver { driftdiffusion { nonlinear_solver = tiber coupling = electrons ksp_type = bcgsl nonlin_max_it = 10 nonlin_step_tol = 1e-3 ls_max_step = 2 } Sweep { sweep_drain { simulation = driftdiffusion # sweep_gate variable = Vd start = 0.0 # 0.2 stop = 1.0 steps = 5 # 4 } sweep_gate { variable = Vg start = -1.0 stop = 0.5 steps = 150 # simulation = driftdiffusion } } } # Definition of Model dependent physical parameters $Physics { driftdiffusion { statistics = FD } } # Definition of model-indipendent parameters of the Simulation $Simulation { # searchpath = ../../materials meshfile = mosfet.msh dimension = 2 temperature = 300 solve = (sweep_drain, sweep_gate) resultpath = output_transf_char_simple_way #output_format = gmv output_format = vtk plot = (Ec, Ev, QFermi_e, QFermi_h, eDensity, hDensity, eCurrent, hCurrent, NetRecombination, EField, ElPotential, ContactCurrents) }